TESCAN S8000X Xe plasma FIB-SEM

The TESCAN S8000X Xe plasma FIB-SEM offers versatility, ultrahigh-resolution imaging and high-speed nanomachining capabilities. It combines TESCAN’s BrightBeam SEM column with its iFIB+ focused ion beam column.

The BrightBeam SEM column affords users field-free, ultrahigh-resolution (UHR) imaging. It features electron optics that improve resolution even at low beam energies, making it suitable for examining challenging non-conductive specimens and useful for the requirements of researchers involved with cutting-edge aspects of material science, eg, nanotechnology/nanomaterials, semiconductors, with additional applications in life science and geosciences.

The iFIB+ Xe plasma FIB column offers good field of view, resulting in the ability to carry out large area cross-sectioning, as well as offering high levels of automation. Using Xe avoids the drawbacks associated with Ga implantation, which can easily alter the sample’s physical properties or poison it. In addition, smaller amorphous layers are produced due to the limited range of Xe ions in materials in comparison with Ga. The S8000X also permits live SEM monitoring of the FIB milling process.

The product benefits from TESCAN’s easily customisable Essence user interface. Each user can have their own application-oriented interface that provides access to the features and functionalities that they need, while those that they don’t can be tucked away. The user interface enables fast, smooth instrument operation and is designed to enhance the user experience for operators of all levels of experience.